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The study of the effects of cooling conditions on high quality graphene growth by the APCVD method.
Nanoscale. 2013 Jun 21; 5(12):5524-9.N

Abstract

The effects of cooling conditions on graphene growth by the atmospheric pressure chemical vapor deposition (APCVD) method on platinum are investigated. It is found that the cooling conditions are the key to better control of the coverage, thickness and uniformity of the graphene films. A series of experiments were carried out with different cooling rates and gas atmospheres. Various characterization techniques (SEM, Raman, AFM and TEM) were applied to examine the graphene morphology and quality. A "three competitive reactions" mechanism is proposed to explain the cooling condition effects. Based on optimized growth conditions, a high-coverage, single-layer graphene film could be grown on Pt using the APCVD method. Back-gated field effect transistors were fabricated and the measured carrier mobility is about 1600 cm(2) V(-1) s(-1).

Authors+Show Affiliations

Institute of Microelectronics, Tsinghua University, Beijing, 100084, China.No affiliation info availableNo affiliation info availableNo affiliation info availableNo affiliation info available

Pub Type(s)

Journal Article
Research Support, Non-U.S. Gov't

Language

eng

PubMed ID

23674269

Citation

Xiao, Ke, et al. "The Study of the Effects of Cooling Conditions On High Quality Graphene Growth By the APCVD Method." Nanoscale, vol. 5, no. 12, 2013, pp. 5524-9.
Xiao K, Wu H, Lv H, et al. The study of the effects of cooling conditions on high quality graphene growth by the APCVD method. Nanoscale. 2013;5(12):5524-9.
Xiao, K., Wu, H., Lv, H., Wu, X., & Qian, H. (2013). The study of the effects of cooling conditions on high quality graphene growth by the APCVD method. Nanoscale, 5(12), 5524-9. https://doi.org/10.1039/c3nr00524k
Xiao K, et al. The Study of the Effects of Cooling Conditions On High Quality Graphene Growth By the APCVD Method. Nanoscale. 2013 Jun 21;5(12):5524-9. PubMed PMID: 23674269.
* Article titles in AMA citation format should be in sentence-case
TY - JOUR T1 - The study of the effects of cooling conditions on high quality graphene growth by the APCVD method. AU - Xiao,Ke, AU - Wu,Huaqiang, AU - Lv,Hongming, AU - Wu,Xiaoming, AU - Qian,He, PY - 2013/5/16/entrez PY - 2013/5/16/pubmed PY - 2013/12/27/medline SP - 5524 EP - 9 JF - Nanoscale JO - Nanoscale VL - 5 IS - 12 N2 - The effects of cooling conditions on graphene growth by the atmospheric pressure chemical vapor deposition (APCVD) method on platinum are investigated. It is found that the cooling conditions are the key to better control of the coverage, thickness and uniformity of the graphene films. A series of experiments were carried out with different cooling rates and gas atmospheres. Various characterization techniques (SEM, Raman, AFM and TEM) were applied to examine the graphene morphology and quality. A "three competitive reactions" mechanism is proposed to explain the cooling condition effects. Based on optimized growth conditions, a high-coverage, single-layer graphene film could be grown on Pt using the APCVD method. Back-gated field effect transistors were fabricated and the measured carrier mobility is about 1600 cm(2) V(-1) s(-1). SN - 2040-3372 UR - https://www.unboundmedicine.com/medline/citation/23674269/The_study_of_the_effects_of_cooling_conditions_on_high_quality_graphene_growth_by_the_APCVD_method_ L2 - https://doi.org/10.1039/c3nr00524k DB - PRIME DP - Unbound Medicine ER -