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On-line sensor monitoring for chemical contaminant attenuation during UV/H2O2 advanced oxidation process.
Water Res. 2015 Sep 15; 81:250-60.WR

Abstract

A combination of surrogate parameters and indicator compounds were measured to predict the removal efficiency of trace organic compounds (TOrCs) using low pressure (LP)-UV/H2O2 advanced oxidation process (AOP), engaged with online sensor-based monitoring system. Thirty-nine TOrCs were evaluated in two distinct secondary wastewater effluents in terms of estimated photochemical reactivity, as a function of the rate constants of UV direct photolysis (kUV) and hydroxyl radical (OH) oxidation (kOH). The selected eighteen TOrCs were classified into three groups that served as indicator compounds: Group 1 for photo-susceptible TOrCs but with minor degradation by OH oxidation (diclofenac, fluoxetine, iohexol, iopamidol, iopromide, simazine and sulfamethoxazole); Group 2 for TOrCs susceptible to both direct photolysis and OH oxidation (benzotriazole, diphenhydramine, ibuprofen, naproxen and sucralose); and Group 3 for photo-resistant TOrCs showing dominant degradation by OH oxidation (atenolol, carbamazepine, DEET, gemfibrozil, primidone and trimethoprim). The results indicate that TOC (optical-based measurement), UVA254 or UVT254 (UV absorbance or transmittance at 254 nm), and total fluorescence can all be used as suitable on-line organic surrogate parameters to predict the attenuation of TOrCs. Furthermore, the automated real-time monitoring via on-line surrogate sensors and equipped with the developed degradation profiles between sensor response and a group of TOrCs removal can provide a diagnostic tool for process control during advanced treatment of reclaimed waters.

Authors+Show Affiliations

Department of Chemical and Environmental Engineering, College of Engineering, University of Arizona, Tucson, AZ 85721, United States; Department of Soil, Water and Environmental Science, College of Agriculture and Life Science, University of Arizona, Tucson, AZ 85721, United States.Department of Chemical and Environmental Engineering, College of Engineering, University of Arizona, Tucson, AZ 85721, United States; Agilent Technologies Inc., Wilmington, DE 19808, United States.Department of Chemical and Environmental Engineering, College of Engineering, University of Arizona, Tucson, AZ 85721, United States.Department of Soil, Water and Environmental Science, College of Agriculture and Life Science, University of Arizona, Tucson, AZ 85721, United States.Xylem Services GmbH, Boschstraβe 4, 32051 Herford, Germany.Department of Chemical and Environmental Engineering, College of Engineering, University of Arizona, Tucson, AZ 85721, United States; National University of Singapore, NUS Environmental Research Institute (NERI), Singapore 117411, Singapore. Electronic address: snyders2@email.arizona.edu.

Pub Type(s)

Journal Article
Research Support, Non-U.S. Gov't

Language

eng

PubMed ID

26074188

Citation

Yu, Hye-Weon, et al. "On-line Sensor Monitoring for Chemical Contaminant Attenuation During UV/H2O2 Advanced Oxidation Process." Water Research, vol. 81, 2015, pp. 250-60.
Yu HW, Anumol T, Park M, et al. On-line sensor monitoring for chemical contaminant attenuation during UV/H2O2 advanced oxidation process. Water Res. 2015;81:250-60.
Yu, H. W., Anumol, T., Park, M., Pepper, I., Scheideler, J., & Snyder, S. A. (2015). On-line sensor monitoring for chemical contaminant attenuation during UV/H2O2 advanced oxidation process. Water Research, 81, 250-60. https://doi.org/10.1016/j.watres.2015.05.064
Yu HW, et al. On-line Sensor Monitoring for Chemical Contaminant Attenuation During UV/H2O2 Advanced Oxidation Process. Water Res. 2015 Sep 15;81:250-60. PubMed PMID: 26074188.
* Article titles in AMA citation format should be in sentence-case
TY - JOUR T1 - On-line sensor monitoring for chemical contaminant attenuation during UV/H2O2 advanced oxidation process. AU - Yu,Hye-Weon, AU - Anumol,Tarun, AU - Park,Minkyu, AU - Pepper,Ian, AU - Scheideler,Jens, AU - Snyder,Shane A, Y1 - 2015/06/03/ PY - 2015/04/19/received PY - 2015/05/28/revised PY - 2015/05/31/accepted PY - 2015/6/16/entrez PY - 2015/6/16/pubmed PY - 2016/4/9/medline KW - Indicator KW - On-line sensor KW - Surrogate KW - Trace organic compound (TOrC) KW - UV/H(2)O(2) KW - Water reuse SP - 250 EP - 60 JF - Water research JO - Water Res VL - 81 N2 - A combination of surrogate parameters and indicator compounds were measured to predict the removal efficiency of trace organic compounds (TOrCs) using low pressure (LP)-UV/H2O2 advanced oxidation process (AOP), engaged with online sensor-based monitoring system. Thirty-nine TOrCs were evaluated in two distinct secondary wastewater effluents in terms of estimated photochemical reactivity, as a function of the rate constants of UV direct photolysis (kUV) and hydroxyl radical (OH) oxidation (kOH). The selected eighteen TOrCs were classified into three groups that served as indicator compounds: Group 1 for photo-susceptible TOrCs but with minor degradation by OH oxidation (diclofenac, fluoxetine, iohexol, iopamidol, iopromide, simazine and sulfamethoxazole); Group 2 for TOrCs susceptible to both direct photolysis and OH oxidation (benzotriazole, diphenhydramine, ibuprofen, naproxen and sucralose); and Group 3 for photo-resistant TOrCs showing dominant degradation by OH oxidation (atenolol, carbamazepine, DEET, gemfibrozil, primidone and trimethoprim). The results indicate that TOC (optical-based measurement), UVA254 or UVT254 (UV absorbance or transmittance at 254 nm), and total fluorescence can all be used as suitable on-line organic surrogate parameters to predict the attenuation of TOrCs. Furthermore, the automated real-time monitoring via on-line surrogate sensors and equipped with the developed degradation profiles between sensor response and a group of TOrCs removal can provide a diagnostic tool for process control during advanced treatment of reclaimed waters. SN - 1879-2448 UR - https://www.unboundmedicine.com/medline/citation/26074188/On_line_sensor_monitoring_for_chemical_contaminant_attenuation_during_UV/H2O2_advanced_oxidation_process_ L2 - https://linkinghub.elsevier.com/retrieve/pii/S0043-1354(15)30048-8 DB - PRIME DP - Unbound Medicine ER -