Tags

Type your tag names separated by a space and hit enter

H2O2 and/or TiO2 photocatalysis under UV irradiation for the removal of antibiotic resistant bacteria and their antibiotic resistance genes.
J Hazard Mater. 2017 Feb 05; 323(Pt B):710-718.JH

Abstract

Inactivating antibiotic resistant bacteria (ARB) and removing antibiotic resistance genes (ARGs) are very important to prevent their spread into the environment. Previous efforts have been taken to eliminate ARB and ARGs from aqueous solution and sludges, however, few satisfying results have been obtained. This study investigated whether photocatalysis by TiO2 was able to reduce the two ARGs, mecA and ampC, within the host ARB, methicillin-resistant Staphylococcus aureus (MRSA) and Pseudomonas aeruginosa, respectively. The addition of H2O2 and matrix effect on the removal of ARB and ARGs were also studied. TiO2 thin films showed great effect on both ARB inactivation and ARGs removal. Approximately 4.5-5.0 and 5.5-5.8 log ARB reductions were achieved by TiO2 under 6 and 12mJ/cm2 UV254 fluence dose, respectively. For ARGs, 5.8 log mecA reduction and 4.7 log ampC reduction were achieved under 120mJ/cm2 UV254 fluence dose in the presence of TiO2. Increasing dosage of H2O2 enhanced the removal efficiencies of ARB and ARGs. The results also demonstrated that photocatalysis by TiO2 was capable of removing both intracellular and extracellular forms of ARGs. This study provided a potential alternative method for the removal of ARB and ARGs from aqueous solution.

Links

Publisher Full Text

Authors+Show Affiliations

State Key Laboratory of Environmental Criteria and Risk Assessment, Chinese Research Academy of Environmental Sciences, Beijing 100012, China.

State Key Laboratory of Environmental Criteria and Risk Assessment, Chinese Research Academy of Environmental Sciences, Beijing 100012, China; Wuxi SensingNet Industrialization Research Institute, Wuxi 214000, China.

State Key Laboratory of Environmental Criteria and Risk Assessment, Chinese Research Academy of Environmental Sciences, Beijing 100012, China.

State Key Laboratory of Environmental Criteria and Risk Assessment, Chinese Research Academy of Environmental Sciences, Beijing 100012, China.

State Key Laboratory of Environmental Criteria and Risk Assessment, Chinese Research Academy of Environmental Sciences, Beijing 100012, China.

State Key Laboratory of Environmental Criteria and Risk Assessment, Chinese Research Academy of Environmental Sciences, Beijing 100012, China.

State Key Laboratory of Simulation and Regulation of Water Cycle in River Basin, and Department of Water Environment, China Institute of Water Resources and Hydropower Research, Beijing 100038, China.

Wuxi SensingNet Industrialization Research Institute, Wuxi 214000, China.

State Key Laboratory of Environmental Criteria and Risk Assessment, Chinese Research Academy of Environmental Sciences, Beijing 100012, China. Electronic address: xujian@craes.org.cn.

MeSH

CatalysisDisinfectionDrug Resistance, BacterialGenes, BacterialHydrogen PeroxideMethicillin-Resistant Staphylococcus aureusPhotolysisPseudomonas aeruginosaTitaniumUltraviolet RaysWater MicrobiologyWater Purification

Pub Type(s)

Journal Article

Language

eng

PubMed ID

27776873

Citation

Guo, Changsheng, et al. "H2O2 And/or TiO2 Photocatalysis Under UV Irradiation for the Removal of Antibiotic Resistant Bacteria and Their Antibiotic Resistance Genes." Journal of Hazardous Materials, vol. 323, no. Pt B, 2017, pp. 710-718.

Guo C, Wang K, Hou S, et al. H2O2 and/or TiO2 photocatalysis under UV irradiation for the removal of antibiotic resistant bacteria and their antibiotic resistance genes. J Hazard Mater. 2017;323(Pt B):710-718.

Guo, C., Wang, K., Hou, S., Wan, L., Lv, J., Zhang, Y., Qu, X., Chen, S., & Xu, J. (2017). H2O2 and/or TiO2 photocatalysis under UV irradiation for the removal of antibiotic resistant bacteria and their antibiotic resistance genes. Journal of Hazardous Materials, 323(Pt B), 710-718. https://doi.org/10.1016/j.jhazmat.2016.10.041

Guo C, et al. H2O2 And/or TiO2 Photocatalysis Under UV Irradiation for the Removal of Antibiotic Resistant Bacteria and Their Antibiotic Resistance Genes. J Hazard Mater. 2017 Feb 5;323(Pt B):710-718. PubMed PMID: 27776873.

* Article titles in AMA citation format should be in sentence-case

TY - JOUR T1 - H2O2 and/or TiO2 photocatalysis under UV irradiation for the removal of antibiotic resistant bacteria and their antibiotic resistance genes. AU - Guo,Changsheng, AU - Wang,Kai, AU - Hou,Song, AU - Wan,Li, AU - Lv,Jiapei, AU - Zhang,Yuan, AU - Qu,Xiaodong, AU - Chen,Shuyi, AU - Xu,Jian, Y1 - 2016/10/19/ PY - 2016/06/07/received PY - 2016/10/11/revised PY - 2016/10/18/accepted PY - 2016/10/26/pubmed PY - 2018/8/7/medline PY - 2016/10/26/entrez KW - Antibiotic resistance genes (ARGs) KW - Antibiotic resistant bacteria (ARB) KW - Photocatalysis KW - Removal KW - TiO(2) SP - 710 EP - 718 JF - Journal of hazardous materials JO - J Hazard Mater VL - 323 IS - Pt B N2 - Inactivating antibiotic resistant bacteria (ARB) and removing antibiotic resistance genes (ARGs) are very important to prevent their spread into the environment. Previous efforts have been taken to eliminate ARB and ARGs from aqueous solution and sludges, however, few satisfying results have been obtained. This study investigated whether photocatalysis by TiO2 was able to reduce the two ARGs, mecA and ampC, within the host ARB, methicillin-resistant Staphylococcus aureus (MRSA) and Pseudomonas aeruginosa, respectively. The addition of H2O2 and matrix effect on the removal of ARB and ARGs were also studied. TiO2 thin films showed great effect on both ARB inactivation and ARGs removal. Approximately 4.5-5.0 and 5.5-5.8 log ARB reductions were achieved by TiO2 under 6 and 12mJ/cm2 UV254 fluence dose, respectively. For ARGs, 5.8 log mecA reduction and 4.7 log ampC reduction were achieved under 120mJ/cm2 UV254 fluence dose in the presence of TiO2. Increasing dosage of H2O2 enhanced the removal efficiencies of ARB and ARGs. The results also demonstrated that photocatalysis by TiO2 was capable of removing both intracellular and extracellular forms of ARGs. This study provided a potential alternative method for the removal of ARB and ARGs from aqueous solution. SN - 1873-3336 UR - https://www.unboundmedicine.com/medline/citation/27776873/H2O2_and/or_TiO2_photocatalysis_under_UV_irradiation_for_the_removal_of_antibiotic_resistant_bacteria_and_their_antibiotic_resistance_genes_ L2 - https://linkinghub.elsevier.com/retrieve/pii/S0304-3894(16)30939-6 DB - PRIME DP - Unbound Medicine ER -