Tags

Type your tag names separated by a space and hit enter

UV/H2O2 process stability and pilot-scale validation for trace organic chemical removal from wastewater treatment plant effluents.
Water Res. 2018 06 01; 136:169-179.WR

Abstract

This study investigated the removal of 15 trace organic chemicals (TOrCs) occurring at ambient concentrations from municipal wastewater treatment plant effluent by advanced oxidation using UV/H2O2 at pilot-scale. Pseudo first-order rate constants (kobs) for photolytic as well as combined oxidative and photolytic degradation observed at pilot-scale were validated with results from a bench-scale collimated beam device. No significant difference was determined between pilot- and lab-scale performance. During continuous pilot-scale operation at constant UV fluence of 800 mJ/cm2 and H2O2 dosage of 10 mg/L, the removal of various TOrCs was investigated. The average observed removal for photo-susceptible (kUV>10-3 cm2/mJ; like diclofenac, iopromide and sulfamethoxazole), moderately photo-susceptible (10-4<kUV<10-3 cm2/mJ; like climbazole, tramadol, sotalol, citalopram, benzotriazole, venlafaxine and metoprolol), and most photo-resistant (kUV<10-4 cm2/mJ; like primidone, carbamazepine and gabapentin) compounds was 90%, 49% and 37% including outliers, respectively. The poorly reactive compound TCEP was not significantly eliminated during pilot-scale experiments. Additionally, based on removal kinetics of photo-resistant TOrCs, continuous pilot-scale operation revealed high variations of OH-radical exposure determined from removal kinetics of photo-resistant TOrCs, primarily due to nitrite concentration fluctuations in the feed water. Furthermore, a correlation between OH-radical exposure and scavenging capacity could be determined and verified by mechanistic modeling using UV fluence, H2O2 dosage, and standard water quality parameters (i.e., DOC, NO3-, NO2- and HCO3-) as model input data. This correlation revealed the possibility of OH-radical exposure prediction by water matrix parameters and proved its applicability for pilot-scale operations.

Authors+Show Affiliations

Chair of Urban Water Systems Engineering, Technical University of Munich, Am Coulombwall 3, 85748, Garching, Germany. Electronic address: d.miklos@tum.de.Chair of Urban Water Systems Engineering, Technical University of Munich, Am Coulombwall 3, 85748, Garching, Germany. Electronic address: rebecca.hartl@tum.de.Chair of Urban Water Systems Engineering, Technical University of Munich, Am Coulombwall 3, 85748, Garching, Germany. Electronic address: philipp.michel@tum.de.Department of Civil, Environmental, and Architectural Engineering, University of Colorado Boulder, UCB 607, Boulder, CO, 80303, USA. Electronic address: karl.linden@colorado.edu.Chair of Urban Water Systems Engineering, Technical University of Munich, Am Coulombwall 3, 85748, Garching, Germany. Electronic address: jdrewes@tum.de.Chair of Urban Water Systems Engineering, Technical University of Munich, Am Coulombwall 3, 85748, Garching, Germany. Electronic address: u.huebner@tum.de.

Pub Type(s)

Evaluation Study
Journal Article
Research Support, Non-U.S. Gov't

Language

eng

PubMed ID

29501761

Citation

Miklos, David B., et al. "UV/H2O2 Process Stability and Pilot-scale Validation for Trace Organic Chemical Removal From Wastewater Treatment Plant Effluents." Water Research, vol. 136, 2018, pp. 169-179.
Miklos DB, Hartl R, Michel P, et al. UV/H2O2 process stability and pilot-scale validation for trace organic chemical removal from wastewater treatment plant effluents. Water Res. 2018;136:169-179.
Miklos, D. B., Hartl, R., Michel, P., Linden, K. G., Drewes, J. E., & Hübner, U. (2018). UV/H2O2 process stability and pilot-scale validation for trace organic chemical removal from wastewater treatment plant effluents. Water Research, 136, 169-179. https://doi.org/10.1016/j.watres.2018.02.044
Miklos DB, et al. UV/H2O2 Process Stability and Pilot-scale Validation for Trace Organic Chemical Removal From Wastewater Treatment Plant Effluents. Water Res. 2018 06 1;136:169-179. PubMed PMID: 29501761.
* Article titles in AMA citation format should be in sentence-case
TY - JOUR T1 - UV/H2O2 process stability and pilot-scale validation for trace organic chemical removal from wastewater treatment plant effluents. AU - Miklos,David B, AU - Hartl,Rebecca, AU - Michel,Philipp, AU - Linden,Karl G, AU - Drewes,Jörg E, AU - Hübner,Uwe, Y1 - 2018/02/21/ PY - 2017/11/30/received PY - 2018/02/14/revised PY - 2018/02/17/accepted PY - 2018/3/5/pubmed PY - 2018/9/11/medline PY - 2018/3/5/entrez KW - Advanced oxidation KW - Modeling KW - OH-Radical exposure KW - Pilot-scale operation KW - Trace organic chemicals KW - Wastewater treatment SP - 169 EP - 179 JF - Water research JO - Water Res VL - 136 N2 - This study investigated the removal of 15 trace organic chemicals (TOrCs) occurring at ambient concentrations from municipal wastewater treatment plant effluent by advanced oxidation using UV/H2O2 at pilot-scale. Pseudo first-order rate constants (kobs) for photolytic as well as combined oxidative and photolytic degradation observed at pilot-scale were validated with results from a bench-scale collimated beam device. No significant difference was determined between pilot- and lab-scale performance. During continuous pilot-scale operation at constant UV fluence of 800 mJ/cm2 and H2O2 dosage of 10 mg/L, the removal of various TOrCs was investigated. The average observed removal for photo-susceptible (kUV>10-3 cm2/mJ; like diclofenac, iopromide and sulfamethoxazole), moderately photo-susceptible (10-4<kUV<10-3 cm2/mJ; like climbazole, tramadol, sotalol, citalopram, benzotriazole, venlafaxine and metoprolol), and most photo-resistant (kUV<10-4 cm2/mJ; like primidone, carbamazepine and gabapentin) compounds was 90%, 49% and 37% including outliers, respectively. The poorly reactive compound TCEP was not significantly eliminated during pilot-scale experiments. Additionally, based on removal kinetics of photo-resistant TOrCs, continuous pilot-scale operation revealed high variations of OH-radical exposure determined from removal kinetics of photo-resistant TOrCs, primarily due to nitrite concentration fluctuations in the feed water. Furthermore, a correlation between OH-radical exposure and scavenging capacity could be determined and verified by mechanistic modeling using UV fluence, H2O2 dosage, and standard water quality parameters (i.e., DOC, NO3-, NO2- and HCO3-) as model input data. This correlation revealed the possibility of OH-radical exposure prediction by water matrix parameters and proved its applicability for pilot-scale operations. SN - 1879-2448 UR - https://www.unboundmedicine.com/medline/citation/29501761/UV/H2O2_process_stability_and_pilot_scale_validation_for_trace_organic_chemical_removal_from_wastewater_treatment_plant_effluents_ L2 - https://linkinghub.elsevier.com/retrieve/pii/S0043-1354(18)30151-9 DB - PRIME DP - Unbound Medicine ER -