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Simultaneous removal of chlorite and contaminants of emerging concern under UV photolysis: Hydroxyl radicals vs. chlorate formation.
Water Res. 2021 Feb 15; 190:116708.WR

Abstract

It is well known that using chlorine dioxide (ClO2) as a disinfectant inevitably produces a common disinfection byproducts chlorite (ClO2‒). In this study, we found that UV photolysis after ClO2 disinfection can effectively eliminate both ClO2‒ and contaminants of emerging concern (CECs). However, the kinetic mechanisms of UV/ClO2‒ process destructing CECs, as well as transformation of ClO2‒ in UV/ClO2‒ system are not clear yet. Therefore, we systematically investigated the UV/ClO2‒ system to assist us appropriately design this process under optimal operational conditions. In this work, we first investigated the impact of water matrix conditions (i.e., pH, bicarbonate and natural organic matter (NOM)) and ClO2‒ dosage on the UV/ClO2‒ process. We found that bicarbonate and NOM have inhibition effects, while lower pH and higher ClO2‒ dosage have enhancement effects. Besides, hydroxyl radical (HO•) and reactive chlorine species (RCS) are generated from UV/ClO2‒ system, and RCS are main contributors to CBZ degradation. Then we proposed a possible degradation pathway of CBZ based on the determined products from experiments. Additionally, we found that photolysis of ClO2‒ resulted in the generation of chloride (Cl‒) and chlorate (ClO3‒). As the ClO2‒ dosage increases, the yield of ClO3‒ increased while that of Cl‒ decreased. Finally, we elucidated the second order rate constant of the target organic compound with HO• has a strong correlation with the formation of ClO3‒.

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Publisher Full Text (DOI)

Authors+Show Affiliations

Wang J
Key Laboratory of Building Safety and Energy Efficiency, Ministry of Education, College of Civil Engineering, Hunan University, Changsha, Hunan, 410082, PR China.
Wu Y
Key Laboratory of Building Safety and Energy Efficiency, Ministry of Education, College of Civil Engineering, Hunan University, Changsha, Hunan, 410082, PR China.
Bu L
Key Laboratory of Building Safety and Energy Efficiency, Ministry of Education, College of Civil Engineering, Hunan University, Changsha, Hunan, 410082, PR China.
Zhu S
Key Laboratory of Building Safety and Energy Efficiency, Ministry of Education, College of Civil Engineering, Hunan University, Changsha, Hunan, 410082, PR China.
Zhang W
Brook Byer Institute for Sustainable Systems and School of Civil and Environmental Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, United States.
Zhou S
Key Laboratory of Building Safety and Energy Efficiency, Ministry of Education, College of Civil Engineering, Hunan University, Changsha, Hunan, 410082, PR China. Electronic address: shiqingzhouwater@163.com.
Gao N
State Key Laboratory of Pollution Control and Resource Reuse, College of Environmental Science and Engineering, Tongji University, Shanghai, 200092, China.

MeSH

ChloratesChloridesChlorineDisinfectionHydroxyl RadicalPhotolysisUltraviolet RaysWater Pollutants, ChemicalWater Purification

Pub Type(s)

Journal Article

Language

eng

PubMed ID

33279746

Citation

Wang, Jue, et al. "Simultaneous Removal of Chlorite and Contaminants of Emerging Concern Under UV Photolysis: Hydroxyl Radicals Vs. Chlorate Formation." Water Research, vol. 190, 2021, p. 116708.
Wang J, Wu Y, Bu L, et al. Simultaneous removal of chlorite and contaminants of emerging concern under UV photolysis: Hydroxyl radicals vs. chlorate formation. Water Res. 2021;190:116708.
Wang, J., Wu, Y., Bu, L., Zhu, S., Zhang, W., Zhou, S., & Gao, N. (2021). Simultaneous removal of chlorite and contaminants of emerging concern under UV photolysis: Hydroxyl radicals vs. chlorate formation. Water Research, 190, 116708. https://doi.org/10.1016/j.watres.2020.116708
Wang J, et al. Simultaneous Removal of Chlorite and Contaminants of Emerging Concern Under UV Photolysis: Hydroxyl Radicals Vs. Chlorate Formation. Water Res. 2021 Feb 15;190:116708. PubMed PMID: 33279746.
* Article titles in AMA citation format should be in sentence-case
TY - JOUR T1 - Simultaneous removal of chlorite and contaminants of emerging concern under UV photolysis: Hydroxyl radicals vs. chlorate formation. AU - Wang,Jue, AU - Wu,Yangtao, AU - Bu,Lingjun, AU - Zhu,Shumin, AU - Zhang,Weiqiu, AU - Zhou,Shiqing, AU - Gao,Naiyun, Y1 - 2020/11/30/ PY - 2020/09/27/received PY - 2020/11/23/revised PY - 2020/11/28/accepted PY - 2020/12/7/pubmed PY - 2021/1/29/medline PY - 2020/12/6/entrez KW - Chlorate KW - Disinfection byproducts KW - Hydroxyl radicals KW - Rate constants KW - Reactive chlorine species SP - 116708 EP - 116708 JF - Water research JO - Water Res VL - 190 N2 - It is well known that using chlorine dioxide (ClO2) as a disinfectant inevitably produces a common disinfection byproducts chlorite (ClO2‒). In this study, we found that UV photolysis after ClO2 disinfection can effectively eliminate both ClO2‒ and contaminants of emerging concern (CECs). However, the kinetic mechanisms of UV/ClO2‒ process destructing CECs, as well as transformation of ClO2‒ in UV/ClO2‒ system are not clear yet. Therefore, we systematically investigated the UV/ClO2‒ system to assist us appropriately design this process under optimal operational conditions. In this work, we first investigated the impact of water matrix conditions (i.e., pH, bicarbonate and natural organic matter (NOM)) and ClO2‒ dosage on the UV/ClO2‒ process. We found that bicarbonate and NOM have inhibition effects, while lower pH and higher ClO2‒ dosage have enhancement effects. Besides, hydroxyl radical (HO•) and reactive chlorine species (RCS) are generated from UV/ClO2‒ system, and RCS are main contributors to CBZ degradation. Then we proposed a possible degradation pathway of CBZ based on the determined products from experiments. Additionally, we found that photolysis of ClO2‒ resulted in the generation of chloride (Cl‒) and chlorate (ClO3‒). As the ClO2‒ dosage increases, the yield of ClO3‒ increased while that of Cl‒ decreased. Finally, we elucidated the second order rate constant of the target organic compound with HO• has a strong correlation with the formation of ClO3‒. SN - 1879-2448 UR - https://www.unboundmedicine.com/medline/citation/33279746/Simultaneous_removal_of_chlorite_and_contaminants_of_emerging_concern_under_UV_photolysis:_Hydroxyl_radicals_vs__chlorate_formation_ DB - PRIME DP - Unbound Medicine ER -