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Stability studies of ZnO and AlN thin film acoustic wave devices in acid and alkali harsh environments.
RSC Adv. 2020 May 20; 10(33):19178-19184.RA

Abstract

Surface acoustic wave (SAW) devices based on piezoelectric thin-films such as ZnO and AlN are widely used in sensing, microfluidics and lab-on-a-chip applications. However, for many of these applications, the SAW devices will inevitably be used in acid or alkali harsh environments, which may cause their early failures. In this work, we investigated the behavior and degradation mechanisms of thin film based SAW devices in acid and alkali harsh environments. Results show that under the acid and alkali attacks, chemical reaction and corrosion of ZnO devices are very fast (usually within 45 s). During the corrosion, the crystalline orientation of the ZnO film is not changed, but its grain defects are significantly increased and the grain sizes are decreased. The velocity of ZnO-based SAW devices is decreased due to the formation of porous structures induced by the chemical reactions. Whereas an AlN thin-film based SAW device does not perform well in acid-alkali conditions, it might be able to maintain a normal performance without obvious degradation for more than ten hours in acid or alkali solutions. This work could provide guidance for the applications of both ZnO or AlN-based SAW devices in acid/alkali harsh environments.

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Authors+Show Affiliations

Xiong S
State Key Laboratory of Advanced Design and Manufacturing for Vehicle Body, College of Mechanical and Vehicle Engineering, Hunan University Changsha 410082 China jianzhou@hnu.edu.cn.
Liu X
State Key Laboratory of Advanced Design and Manufacturing for Vehicle Body, College of Mechanical and Vehicle Engineering, Hunan University Changsha 410082 China jianzhou@hnu.edu.cn.
Zhou J
State Key Laboratory of Advanced Design and Manufacturing for Vehicle Body, College of Mechanical and Vehicle Engineering, Hunan University Changsha 410082 China jianzhou@hnu.edu.cn.
Liu Y
Hunan Provincial Key Laboratory of Health Maintenance for Mechanical Equipment, Hunan University of Science and Technology Xiangtan 411201 China.
Shen Y
Hunan Provincial Key Laboratory of Health Maintenance for Mechanical Equipment, Hunan University of Science and Technology Xiangtan 411201 China.
Yin X
State Key Laboratory of Advanced Design and Manufacturing for Vehicle Body, College of Mechanical and Vehicle Engineering, Hunan University Changsha 410082 China jianzhou@hnu.edu.cn.
Wu J
State Key Laboratory of Advanced Design and Manufacturing for Vehicle Body, College of Mechanical and Vehicle Engineering, Hunan University Changsha 410082 China jianzhou@hnu.edu.cn.
Tao R
Faculty of Engineering and Environment, Northumbria University Newcastle upon Tyne NE1 8ST UK.
Fu Y
Faculty of Engineering and Environment, Northumbria University Newcastle upon Tyne NE1 8ST UK.
Duan H
State Key Laboratory of Advanced Design and Manufacturing for Vehicle Body, College of Mechanical and Vehicle Engineering, Hunan University Changsha 410082 China jianzhou@hnu.edu.cn.

Pub Type(s)

Journal Article

Language

eng

PubMed ID

35515426

Citation

Xiong, Shuo, et al. "Stability Studies of ZnO and AlN Thin Film Acoustic Wave Devices in Acid and Alkali Harsh Environments." RSC Advances, vol. 10, no. 33, 2020, pp. 19178-19184.
Xiong S, Liu X, Zhou J, et al. Stability studies of ZnO and AlN thin film acoustic wave devices in acid and alkali harsh environments. RSC Adv. 2020;10(33):19178-19184.
Xiong, S., Liu, X., Zhou, J., Liu, Y., Shen, Y., Yin, X., Wu, J., Tao, R., Fu, Y., & Duan, H. (2020). Stability studies of ZnO and AlN thin film acoustic wave devices in acid and alkali harsh environments. RSC Advances, 10(33), 19178-19184. https://doi.org/10.1039/d0ra02448a
Xiong S, et al. Stability Studies of ZnO and AlN Thin Film Acoustic Wave Devices in Acid and Alkali Harsh Environments. RSC Adv. 2020 May 20;10(33):19178-19184. PubMed PMID: 35515426.
* Article titles in AMA citation format should be in sentence-case
TY - JOUR T1 - Stability studies of ZnO and AlN thin film acoustic wave devices in acid and alkali harsh environments. AU - Xiong,Shuo, AU - Liu,Xudong, AU - Zhou,Jian, AU - Liu,Yi, AU - Shen,Yiping, AU - Yin,Xiaobo, AU - Wu,Jianhui, AU - Tao,Ran, AU - Fu,Yongqing, AU - Duan,Huigao, Y1 - 2020/05/20/ PY - 2020/03/16/received PY - 2020/05/11/accepted PY - 2022/5/6/entrez PY - 2020/5/20/pubmed PY - 2020/5/20/medline SP - 19178 EP - 19184 JF - RSC advances JO - RSC Adv VL - 10 IS - 33 N2 - Surface acoustic wave (SAW) devices based on piezoelectric thin-films such as ZnO and AlN are widely used in sensing, microfluidics and lab-on-a-chip applications. However, for many of these applications, the SAW devices will inevitably be used in acid or alkali harsh environments, which may cause their early failures. In this work, we investigated the behavior and degradation mechanisms of thin film based SAW devices in acid and alkali harsh environments. Results show that under the acid and alkali attacks, chemical reaction and corrosion of ZnO devices are very fast (usually within 45 s). During the corrosion, the crystalline orientation of the ZnO film is not changed, but its grain defects are significantly increased and the grain sizes are decreased. The velocity of ZnO-based SAW devices is decreased due to the formation of porous structures induced by the chemical reactions. Whereas an AlN thin-film based SAW device does not perform well in acid-alkali conditions, it might be able to maintain a normal performance without obvious degradation for more than ten hours in acid or alkali solutions. This work could provide guidance for the applications of both ZnO or AlN-based SAW devices in acid/alkali harsh environments. SN - 2046-2069 UR - https://www.unboundmedicine.com/medline/citation/35515426/Stability_studies_of_ZnO_and_AlN_thin_film_acoustic_wave_devices_in_acid_and_alkali_harsh_environments_ DB - PRIME DP - Unbound Medicine ER -